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Junction Technology Group - Proceedings

July 2016
Topic: New Processes and Tools for Implantation, Annealing and Metrologies
Download Agenda

-Tom Karpowicz, CAPRES
Micro Four Point Probing for Advanced Nodes
(3.9Mb pdf)

-Babak Adibi, Intevac
Efficacy & Cost Advantages are Driving Ion Implant Adoption in Commercial PV Cell Fabrication
(1.8Mb pdf)

-Fareen Adeni Khaja, Applied Materials
Contact Resistance Reduction using Advanced Implant and Anneal Techniques for 7 nm Node and Beyond
(1.5Mb pdf)

-Nobuhiro Tokoro, Nissin Ion
Medium Current Ion Implanter 3000AH-8C
(2.8Mb pdf)

-Dick James, ChipWorks
Moore's Law into the 1x-nm Era
(8.8Mb pdf)

-Jim McWhirter, Ultratech
LXA: Nanosecond Laser Anneal for sub-10nm
(1.4Mb pdf)

-John Borland, JOB Technologies
Highlights of IWJT16, VLSI16 & IIT16
(5.4Mb pdf)

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