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Junction Technology Group - Proceedings

September 2010
Topic: Papers from IIT 2010: Toxic gas capture, in-situ cleans, PIII profiles, etc.

Toxic Gas Capture, (907k pdf)
-Maki Egami, Takachiho Chemical, makishots@aol.com

In-situ F cleaning of implanters by remote plasma generation, (1.54MB pdf)
-Tom Horsky, SemEquip, thorsky@semequip.com

Lubricant-based contamination and off-line source conditioning,
-Ron Eddy, Core Systems, reddy@coresystems.com
(NA)

PIII profiles for B2H6 and BF3 source gases, (6.85MB pdf)
-Susan Felch, IBS, susan.felch@ion-beam-services.fr

Gas source materials and cleans (provisional),
-Jim Mayer, ATMI, jmayer@atmi.com
NA)

Halo ion effects on junction activation and leakage, (1.75MB pdf)
-Michael Current, Current Scientific, currentsci@aol.com


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