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Junction Technology Group - Proceedings

July, 2005

B10H14 Implantation for 45nm Node USJ Doping
  Masayasu Tanjyo, Nissin Ion Equipment Co., Ltd.

Cluster Implants for Advanced Productivity
  Dr. Leonard Rubin, Axcelis Technologies

Flash Lamp Annealing
  J. C. Gelpey, Mattson Technology Canada Inc.

Infusion Doping for USJ Semicon 2005
  Matthew Gwinn, Epion Corporation

Issues & Innovations For 45nm Node USJ Formation (Activation, Metrology & Doping)
  John O. Borland, J.O.B. Technologies

Plasma Doping (PLAD) for Advanced USJ Applications
  S. Walther, Varian Semiconductor Equipment

Use of Co-Implantation to Extend Spike RTP to the 65nm Node and Beyond
  Susan Felch, Applied Materials, Inc.

Why Cluster Implantation?
  Tom Horsky, SemEquip

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