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2005 Annual
Symposium Papers


Junction Technology Group - Proceedings

2004
 April
Junction Scaling Technology for the sub-90 nm Node and Beyond
  Jack Hwang, Intel

Precision Alignment of the GSD End Station
  John Schuur, Innovion

Ultra-Shallow Junction Formation Techniques to Satisfy Advanced Device Requirements
  Susan Felch, Applied Materials

Ultra-Shallow Junctions with PLAD
  Jinning Liu, Varian Semiconductor Equipment Associates

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