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2005 Annual
Symposium Papers


Junction Technology Group - Proceedings

July, 2002

Comparison of Indium Metrology using LEXES and SIMS
  Dimitry Kouzminov, Accurel

Plasma Doping as a Tool for the Fabrication of Advanced Semiconductor Devices
  Susan Felch, Varian Semiconductor Equipment

Recent Advances in Implant Metrology with the Shallow Probe/LEXES Tool from Cameca
  Pierre Straub, Cameca

Spike RTP for Ultra-Shallow Junction Formation
  Paul Timans, Mattson

Update on Implant Dopant Materials
  Jim Mayer, ATMI Inc.

Web-based Ion Implantation Course
  Michael Current, SemiZone

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